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The PSM1000 is an OEM-ready instrument for the best images of flat, reflective specimens. Samples from metallurgy and the semiconductor field are treated by ELWD Plan Apochromatic objectives with a stupendous resolution power. The large FOV24 with an erect, true sided image allows fast orientation and manipulation work.
Laser Ready Modular Microscope
| Model | ||||
| Observation tube | Trinocular head, Siedentopf type | Trinocular head, Siedentopf type | Trinocular tilting head 3º-30º, Siedentopf type | Trinocular tilting head 3º-30º, Siedentopf type |
| Optical system | Specialized lenses design, covers the spectrums ranging from the NUV to visible to NIR | Specialized lenses design, covers the spectrums ranging from the NUV to visible to NIR | Specialized lenses design, covers the spectrums ranging from the NUV to visible to NIR | Specialized lenses design, covers the spectrums ranging from the NUV to visible to NIR |
| Inclination | 30° inclined | 30° inclined | Tilting 3~30º | Tilting 3~30º |
| Trinocular light split | 50:50/0:100 | 50:50/0:100 | 50:50/0:100 | 50:50/0:100 |
| Interpupillary distance | 55-75mm | 55-75mm | 55-75mm | 55-75mm |
| Diopter adjustment | On both eyepieces, +/- 5 diopter | On both eyepieces, +/- 5 diopter | On both eyepieces, +/- 5 diopter | On both eyepieces, +/- 5 diopter |
| Eyepieces | Widefield WF10X/24mm with diopter adjustment | Widefield WF10X/24mm with diopter adjustment | Widefield WF10X/24mm with diopter adjustment | Widefield WF10X/24mm with diopter adjustment |
| Intermediate body | 3-lens change-over turret; 1X UV/VIS (for 355-532nm), 1X IR/VIS (for 532-1064nm) and 2X | 3-lens change-over turret; 1X UV/VIS (for 355-532nm), 1X IR/VIS (for 532-1064nm) and 2X | 3-lens change-over turret; 1X UV/VIS (for 355-532nm), 1X IR/VIS (for 532-1064nm) and 2X | 3-lens change-over turret; 1X UV/VIS (for 355-532nm), 1X IR/VIS (for 532-1064nm) and 2X |
| Nosepiece | Quadruple, single centerable positions | Quadruple, single centerable positions | Quadruple, single centerable positions | Quadruple, single centerable positions |
| Objective classification | Extra long working distance Plan Apochromatic | Extra long working distance Plan Apochromatic | Extra long working distance Plan Apochromatic | Extra long working distance Plan Apochromatic |
| Objectives | Optional | Optional | Optional | Optional |
| Objective mounting thread | M26X0.706 | M26X0.706 | M26X0.706 | M26X0.706 |
| Stand type | Optional | Optional | Optional | Optional |
| Focus mechanism | - | Coaxial coarse and fine focusing system with tension adjustment | - | Coaxial coarse and fine focusing system with tension adjustment |
| Fine focus precision | - | 1 μm minimum increment | - | 1 μm minimum increment |
| Focusing stroke | - | 50mm | - | 50mm |
| Incident illumination | Port for fiber-optic coaxial illumination | Port for fiber-optic coaxial illumination | Port for fiber-optic coaxial illumination | Port for fiber-optic coaxial illumination |
| Accessories included | Laser safety kit, shims, laser safety pin | Laser safety kit, shims, laser safety pin | Laser safety kit, shims, laser safety pin | Laser safety kit, shims, laser safety pin |
| Standard contrast technique | Brightfield | Brightfield | Brightfield | Brightfield |
| Polarization | Optional sliders | Optional sliders | Optional sliders | Optional sliders |
